Direct observation of the Si(110)-(16×2) surface reconstruction by atomic force microscopy

• Tatsuya Yamamoto,
• Ryo Izumi,
• Kazushi Miki,
• Takahiro Yamasaki,
• Yasuhiro Sugawara and
• Yan Jun Li

Beilstein J. Nanotechnol. 2020, 11, 1750–1756, doi:10.3762/bjnano.11.157

• reliable production of nanowires and other nanostructures [7][10][11][12][13]. By annealing below 700 °C [14], the Si(110)-(16×2) reconstruction is formed over large areas on the Si(110) surface. It has been widely investigated by reflection high-energy electron diffraction (RHEED) analysis [14][15

Proximity effect in [Nb(1.5 nm)/Fe(x)]₁₀/Nb(50 nm) superconductor/ferromagnet heterostructures

• Yury Khaydukov,
• Sabine Pütter,
• Laura Guasco,
• Roman Morari,
• Gideok Kim,
• Thomas Keller,
• Anatolie Sidorenko and
• Bernhard Keimer

Beilstein J. Nanotechnol. 2020, 11, 1254–1263, doi:10.3762/bjnano.11.109

• thermal evaporation from an effusion cell while Nb and Pt were grown by electron beam evaporation. Reflection high-energy electron diffraction (RHEED) was measured in situ during deposition to trace the structure of the atomic layer being deposited. For the RHEED experiment, an electron beam of 15 keV

Combined pulsed laser deposition and non-contact atomic force microscopy system for studies of insulator metal oxide thin films

• Daiki Katsube,
• Hayato Yamashita,
• Satoshi Abo and
• Masayuki Abe

Beilstein J. Nanotechnol. 2018, 9, 686–692, doi:10.3762/bjnano.9.63

•  1 shows a schematic diagram of the combined NC-AFM and PLD system that was developed. It includes UHV chambers for sample preparation, low-energy electron diffraction (LEED), and load locking. It is also designed to allow for adding surface analysis capabilities such as reflection high-energy

• electron diffraction (RHEED). Sample preparation and NC-AFM, STM and LEED measurements can be performed while keeping the sample under UHV. The PLD chamber was designed to be as small as possible for easy sample exchange and transfer. In addition, a small design would lead to smaller vibrations during AFM

Dopant-stimulated growth of GaN nanotube-like nanostructures on Si(111) by molecular beam epitaxy

• Alexey D. Bolshakov,
• Alexey M. Mozharov,
• Georgiy A. Sapunov,
• Igor V. Shtrom,
• Nickolay V. Sibirev,
• Vladimir V. Fedorov,
• Evgeniy V. Ubyivovk,
• Maria Tchernycheva,
• George E. Cirlin and
• Ivan S. Mukhin

Beilstein J. Nanotechnol. 2018, 9, 146–154, doi:10.3762/bjnano.9.17

• /h on a substrate that underwent low-temperature (850 °C) annealing. It should be mentioned that in this case a silicon oxide layer covering the substrate was removed only partially or was not removed at all. This conclusion is based on the analysis of in situ reflection high-energy electron

• diffraction (RHEED) patterns: we did not observe (7 × 7) a Si surface reconstruction pattern while cooling down the substrate that was subjected to the low temperature annealing. On the contrary, when the high temperature annealing (at least 920 °С) was applied, we observed a clear (7 × 7) reconstruction

Precise in situ etch depth control of multilayered III−V semiconductor samples with reflectance anisotropy spectroscopy (RAS) equipment

• Ann-Kathrin Kleinschmidt,
• Lars Barzen,
• Johannes Strassner,
• Christoph Doering,
• Henning Fouckhardt,
• Wolfgang Bock,
• Michael Wahl and
• Michael Kopnarski

Beilstein J. Nanotechnol. 2016, 7, 1783–1793, doi:10.3762/bjnano.7.171

• techniques (as, e.g., reflection high-energy electron diffraction (RHEED)), which might not be applicable in some set-ups. Recording a RAS color plot is time-consuming, i.e., monitoring a single RAS spectrum from 1.5–5.0 eV photon energy with a step size of 0.1 eV during reactive ion etching (the substrate

Orientation of FePt nanoparticles on top of a-SiO₂/Si(001), MgO(001) and sapphire(0001): effect of thermal treatments and influence of substrate and particle size

• Martin Schilling,
• Paul Ziemann,
• Zaoli Zhang,
• Johannes Biskupek,
• Ute Kaiser and
• Ulf Wiedwald

Beilstein J. Nanotechnol. 2016, 7, 591–604, doi:10.3762/bjnano.7.52

• pulsed laser deposition (PLD), served as reference samples. The structural properties were probed in situ, particularly texture formation and epitaxy of the specimens by reflection high-energy electron diffraction (RHEED) and, in case of 3 nm nanoparticles, additionally by high-resolution transmission

• transmission electron microscopy (HRTEM); nanoparticles; reflection high-energy electron diffraction (RHEED); solid-phase epitaxy; texture; Introduction Due to their attractive catalytic properties for oxygen reduction reactions (ORR) [1][2] as well as their high magnetocrystalline anisotropy energy density

Scanning reflection ion microscopy in a helium ion microscope

• Yuri V. Petrov and
• Oleg F. Vyvenko

Beilstein J. Nanotechnol. 2015, 6, 1125–1137, doi:10.3762/bjnano.6.114

• incidence angles, yet was still more pronounced in REM as compared to TEM [2][4]. The further development of REM in ultrahigh vacuum conditions allowed imaging of the single atomic steps [5][6][7][8] and monitoring of atomic layer-by-layer crystal growth by means of reflection high energy electron

• diffraction (RHEED) [9]. In the late 1960s, scanning reflection electron microscopy (SREM) was developed [10][11] for the scanning electron microscope (SEM). Chromatic aberration does not appear in SEM because the sample is placed outside of the electron optics. Both REM and SREM require a sufficiently long

Towards precise defect control in layered oxide structures by using oxide molecular beam epitaxy

• Federico Baiutti,
• Georg Christiani and
• Gennady Logvenov

Beilstein J. Nanotechnol. 2014, 5, 596–602, doi:10.3762/bjnano.5.70

• number and species of atoms forming each atomic layer is placed on the growing surface at the right time, so that each of them is deposited singularly and in a sequence defined by the operator. Key tool for the ALL-MBE technique is the reflection high-energy electron diffraction (RHEED) system, which

Structure, morphology, and magnetic properties of Fe nanoparticles deposited onto single-crystalline surfaces

• Armin Kleibert,
• Wolfgang Rosellen,
• Mathias Getzlaff and
• Joachim Bansmann

Beilstein J. Nanotechnol. 2011, 2, 47–56, doi:10.3762/bjnano.2.6

• combined approach of X-ray magnetic circular dichroism (XMCD), reflection high energy electron diffraction (RHEED) and scanning tunneling microscopy (STM) to shed light on the complex and size-dependent relation between magnetic properties, crystallographic structure, orientation and morphology. In